掩模版清洗机设备/Mask Cleaner
Kzone has completed independent research and development of mask cleaning machine equipment for sizes from G2.5 to G6 and above
Cleaning quality：No mura, water mark, rust, stain or damage
Flatness：100-micron level
Total pitch variation (TPV)：micron level
Quantity of defects：10ea
Transport repeatability：Millimeter level
Temperature stability：±1°（within 60°）
Ultrasonic：
1、Complex-frequency ultrasonic wave in 4 bands, whose frequency can be freely switched
2、Spherical wave ultrasonic technology without dead zone
G6H 掩模版清洗机/Mask Cleaner
